发明名称 Alignment system, alignment method, and lithographic apparatus
摘要 A system and a method for aligning two devices with respect to each other are presented. A first device is provided with a proximity switch and the second device is provided with a reference mark. When the second device enters a detection area of the proximity switch, a first state of the proximity switch changes to a second state, thus indicating a position of the second device with respect to the proximity switch. When the position of the second device is known with respect to the proximity switch, the devices may be positioned to a desired position with respect to each other. The proximity switch may be used to determine the position of the other device in a number of directions. Both the position and the orientation of the first device with respect to the second device may be determined using the proximity switch.
申请公布号 US7151591(B2) 申请公布日期 2006.12.19
申请号 US20040950668 申请日期 2004.09.28
申请人 ASML NETHERLANDS B.V. 发明人 BIJVOET DIRK-JAN
分类号 G03B27/42 主分类号 G03B27/42
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