| 摘要 |
The present invention provides a film deposition system capable of effectively cooling a work having a large volume, and a film deposition method using this system. The film deposition system has, within a vacuum chamber 1 , an evaporation source 3 for forming a film on a work 2 and a cooling device 4 for cooling the work 2 , characterized in that the work 2 has an internal space 15 communicating with the outside through an opening part 14 , and the cooling device 4 is insertable to and drawable from the internal space 15 through the opening part 14 of the work 2 to cool the work 2 from the inside.
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