发明名称 LIGHT SOURCE FOR PHOTOLITHOGRAPHY
摘要 <p>A hybrid light source for photolithography is disclosed. According to an embodiment of the invention, a light source comprises, a head, a first set of poles coupled to the head, the first set of poles are located approximately at an outer edge of the head, and a second set of poles coupled to the head located between the outer edge and a center of the head. According to a further embodiment of the invention, the poles are adjustable to change the characteristics of the light source.</p>
申请公布号 KR20060130235(A) 申请公布日期 2006.12.18
申请号 KR20067020473 申请日期 2006.09.29
申请人 INTEL CORP. 发明人 PADIYAR SUSHIL D.;YANG HSUEN;LEE EVERETT B.
分类号 H01L21/027;G03B27/54;G03F7/00;G03F7/20 主分类号 H01L21/027
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