APPARATUS FOR SUBSTRATE CLEANING DRY

摘要

A substrate cleaning/drying apparatus is provided to consistently maintain concentration of isopropyl alcohol, if process conditions are altered, thereby improving an ability of a dry process. A substrate is cleaned and dried in a process chamber(110). An evaporator(124) heats a mixture of a carrier gas and an organic solvent to generate a dry fluid. An organic solvent supply unit supplies the organic solvent to the evaporator. A carrier gas supply unit supplies the carrier gas to the evaporator. A concentration maintaining unit(140) constantly maintains concentration of the organic solvent supplied to the process chamber. The concentration maintaining unit has a flow rate control member controlling an amount of the carrier gas to be supplied to the evaporator.