发明名称 NOZZLE UNIT AND APPARATUS HAVING THE SAME FOR FORMING A PHOTORESIST LAYER
摘要 A nozzle unit and an apparatus for forming a photoresist layer having the same are provided to easily remove photoresist solids fixed onto a slope surface of a nozzle part, thereby improving the cleanness of the nozzle unit, by forming a cleaning solution ejecting opening in the slope surface of the nozzle part. A nozzle unit comprises a body(130) and a nozzle part(150). A photoresist supply passage(115) and a cleaning solution passage(131) are formed in the body. The nozzle part is protruded from the body and configured to eject the photoresist. Cleaning solution ejecting openings(155) are communicated with the cleaning solution passage within the nozzle part. The cleaning solution is applied to photoresist solids fixed onto a surface of the nozzle part.
申请公布号 KR20060129827(A) 申请公布日期 2006.12.18
申请号 KR20050050506 申请日期 2005.06.13
申请人 SAMSUNG ELECTRONICS CO., LTD. 发明人 LEE, YEONG BEOM;LEE, YONG EUI;YOO, JI HEUM
分类号 G02F1/13 主分类号 G02F1/13
代理机构 代理人
主权项
地址