APPARATUS FOR CLEANING A RETICLE AND APPARATUS FOR EXPOSING A SUBSTRATE HAVING THE SAME

摘要

An apparatus for cleaning a reticle and an apparatus for exposing a substrate having the same are provided to remove foreign materials from a reticle by using a gas injection method. A stage(110) is used for supporting a reticle. A chamber(120) is used for accommodating the stage. A cleaning gas supply unit injects cleaning gas onto the reticle in order to remove foreign materials. The stage includes a supporting plate(112) in order to support the reticle in a vertical direction. The cleaning gas is injected vertically to a front surface or a rear surface of the reticle on the stage. An exhaust line(142) is connected with the chamber in order to exhaust residual gas of the chamber and to discharge the foreign materials from the reticle.