| 摘要 |
<p>A WEE(Wafer Edge Exposure) apparatus is provided to improve illumination efficiency of light irradiated onto a wafer and to enhance the lifetime by using one quartz fiber as a light guide. A WEE apparatus includes an optical module and a shutter. The optical module is composed of a wafer stage, a light source, and a light guide. The wafer stage(110) is used for loading stably a wafer. The light source(120) is used for irradiating a predetermined light onto the wafer. The light guide(140) includes a quartz fiber. The shutter(130) is used for transmitting selectively the predetermined light of the light source into the optical module by blocking the predetermined light.</p> |
