PLASMA PROCESSING APPARATUS

摘要

A plasma treatment apparatus is provided to prevent the damage of a substrate and to minimize an inner space of a vacuum chamber by supplying a properly mixed source gas into the chamber in an aiming dispersing speed state using an improved supply unit. A plasma treatment apparatus includes a supply unit. The supply unit(110) is composed of a diffusing part(120) for supplying a source gas in an upper electrode(100) and a spraying plate for spraying uniformly the source gas supplied from the diffusing part into a vacuum chamber(10). The diffusing part is composed of an inlet port(122), a diffuser(124) connected through the inlet port and a mixer(126) for mixing properly the source gas.