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发明名称
光阻聚合物、光阻组合物及制备半导体装置之方法
摘要
本发明揭示一种含氟组份之光阻聚合物、一种含有该光阻聚合物及一降低表面张力之有机溶剂的光阻组合物，及一种使用该等物制备一半导体装置之方法，该方法系藉由在一下覆层图案之整个表面上均匀地形成一光阻薄膜来允许随后之离子植入制程稳定地进行。094147301-p01.bmp
申请公布号
TW200643626
申请公布日期
2006.12.16
申请号
TW094147301
申请日期
2005.12.29
申请人
海力士半导体股份有限公司
发明人
郑载昌
分类号
G03F7/039(2006.01);H01L21/027(2006.01)
主分类号
G03F7/039(2006.01)
代理机构
代理人
陈长文
主权项
地址
韩国
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