| 摘要 |
<p>An exposure apparatus capable of excellent measurement to perform accurate exposure processing even if a liquid immersion method is applied to a twin-stage-type exposure device. The exposure apparatus (EX) has two substrate stages (PST1, PST2) capable of moving while holding a substrate (P), an exposure station (STE) for exposing the substrate (P) through a projection optical system (PL) and liquid (LQ) with the substrate (P) held by one of the substrate stages(PST1), and a measurement station (STA) for measuring the other substrate stage (PST2) or the substrate (P) held by the other substrate stage (PST2). The measurement by the measurement station (STA) is made with the liquid (LQ) placed on the substrate stage (PST2) or on the substrate (P).</p> |
