发明名称 PHOTO-SENSITIVE COMPOSITION, PHOTO-SENSITIVE PASTE COMPOSITION FOR BARRIER RIBS COMPRISING THE SAME, AND METHOD FOR PREPARING BARRIER RIBS FOR PLASMA DISPLAY PANEL
摘要 A photosensitive composition, which has a cross-linking monomer having at least two ethylenic double bonds, a photopolymerization initiator, and an organic solvent, and a method of preparing a barrier rib for a plasma display panel, wherein the photosensitive composition is used. The photosensitive composition provides improved adherence to an inorganic material and an organic material.
申请公布号 KR100658714(B1) 申请公布日期 2006.12.15
申请号 KR20040099482 申请日期 2004.11.30
申请人 发明人
分类号 H01J17/49;G03F7/004;G03F7/028;G03F7/26;H01J9/02;H01J11/22;H01J11/34;H01J11/36 主分类号 H01J17/49
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