| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an aligner which has high throughput by shortening the detection time. <P>SOLUTION: The aligner includes an illumination optical system for exposure which illuminates an original plate by predetermined exposure light, a projection optical system which projects a pattern on the original plate onto a substrate, and a position detecting means which detects the position of the original plate or the substrate. The illumination optical system for exposure includes an aperture stop which can vary an exposure region. The position detecting means consists of a plurality of detection systems having individual driving mechanisms, and has a stand-by position at the time of exposure and a stand-by position at the time of non-measurement according to the shape of the aperture stop. <P>COPYRIGHT: (C)2007,JPO&INPIT |
