| 摘要 |
<P>PROBLEM TO BE SOLVED: To improve productivity by providing a method by which the lowering of the deposition speed of a thin film, that is caused by densifying the structure of the thin film, is suppressed to be minimum and the change with the passage of time of optical characteristics is suppressed to be minimum. <P>SOLUTION: The method has a process for depositing an oxide thin film by sticking sputtering particles of a target onto a substrate in a reduced pressure atmosphere. In the process, after depositing the thin film under such a condition that gaseous argon and gaseous oxygen are introduced into the reduced pressure atmosphere, moisture is added in addition to the gaseous argon and gaseous oxygen without stopping discharge or changing the conditions and the film deposition is continued, and thereafter the film deposition is completed. <P>COPYRIGHT: (C)2007,JPO&INPIT |
