| 摘要 |
PROBLEM TO BE SOLVED: To provide a technology of enabling to control charge of a testpiece in an electron microscope application device and a testpiece inspecting method. SOLUTION: This has a structure in which a charge control electrode 4 to emit photoelectrons 2 is arranged directly on a wafer 3 (testpiece) in parallel, and which has a hole to penetrate so as to irradiate an ultraviolet light onto the wafer 3 through the charge control electrode 4. Concreteley, a metal plate of a mesh state or having one hole or a plurality of holes is made to be the charge control electrode 4. By installing the charge control electrode 4 directly on the sample in parallel, in the case a negative voltage is applied, because an electric field is generated nearly perpendicularly to the wafer, the photoelectrons 2 are adsorbed to the wafer 3 efficiently. Moreover, by using the charge control electrode 4 having nearly the same size as that of the wafer 3, charge of the whole face of the wafer can be removed collectively and homogeneously, and time required for the treatment can be shortened. COPYRIGHT: (C)2007,JPO&INPIT
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