| 摘要 |
PROBLEM TO BE SOLVED: To improve an etching characteristic in a working method for forming a fine rugged pattern by etching one state of a phase transition material. SOLUTION: Preliminary treatment for etching is applied to a phase transition film by using water, an alkaline solution, an acid solution, or a surfactant. Since treatment for enabling the etching solution to easily penetrate into a part to be removed is applied to the part to be removed, the part to be removed can be completely removed without leaving a film, the etching resistance of the remaining part is improved and an effect for stabilizing the process can be obtained. COPYRIGHT: (C)2007,JPO&INPIT
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