发明名称 HIGH THROUGHPUT PHYSICAL VAPOR DEPOSITION SYSTEM FOR MATERIAL COMBINATORIAL STUDIES
摘要 An infinitely variable physical vapor deposition matrix system that allows the synthesis of multiple combinatorial catalyst samples at essentially the same time, by the co-deposition of multiple materials, or the sequential layer by layer deposition of multiple catalyst constituents, or both, such that the optimum mix of materials for a pre-determined application can be experimentally determined in subsequent testing. The discovery of optimal catalyst combinations for utilization in specified reactions and devices is facilitated. The high throughput system reduces the time and complexity of processing typically required to formulate and test combinatorial catalyst materials.
申请公布号 WO2005070107(A3) 申请公布日期 2006.12.14
申请号 WO2005US00609 申请日期 2005.01.11
申请人 HONDA MOTOR CO. LTD.;HE, TING;KREIDLER, ERIC, R.;NOMURA, TADASHI 发明人 HE, TING;KREIDLER, ERIC, R.;NOMURA, TADASHI
分类号 C23C4/00;C23C4/12;C23C14/04;C23C14/32;C23C14/50;C23C14/54;C23C16/00 主分类号 C23C4/00
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