发明名称 |
LITHOGRAPHIC PROJECTION DEVICE, METHOD AND SUBSTRATE FOR MANUFACTURING ELECTRONIC DEVICES, AND OBTAINED ELECTRONIC DEVICE |
摘要 |
<p>The invention proposes a lithographic projection device such as a wafer stepper for forming a pattern on a substrate or wafer, comprising a(n) (actinic) radiation or light source (2), illumination optics (4) for directing light issuing from said light source onto a mask (6) and projection optics (8) for directing diffracted radiation or light from said mask to the substrate/wafer to be imaged, wherein an optical filter (9) is provided downstream of said projection optics and an imageable substrate (7) having an optical filter (9) on the side to be imaged.</p> |
申请公布号 |
KR20060128893(A) |
申请公布日期 |
2006.12.14 |
申请号 |
KR20067012280 |
申请日期 |
2006.06.21 |
申请人 |
KONINKLIJKE PHILIPS ELECTRONICS N.V.;INTERUNIVERSITAIR MICRO-ELECTRONICACENTRUM VZW |
发明人 |
DIRKSEN PETER |
分类号 |
H01L21/027;G03F7/20 |
主分类号 |
H01L21/027 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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