| 摘要 |
<p>An overlay measurement apparatus with an illumination device is provided to simply and exactly set a position of a lamp by monitoring an intensity of incident light. An illumination section illuminates light to a wafer to measure an overlap degree. A position controller(101) sets a position of the illumination section. The illumination section and the position controller are installed at a case. A light intensity display device(110) displays an intensity of light, which is incident to the wafer. The light intensity display device is installed at a surface of the case, and monitors intensity of light changed according to a position of the illumination section. The illumination section includes a lamp(103) and a holder(102). The holder(102) fixes the lamp and is moved by the position controller.</p> |
