发明名称 ELECTRICALLY CHARGED PARTICLE APPLICATION APPARATUS
摘要 PROBLEM TO BE SOLVED: To prevent physical damage to a vacuum chamber by preventing build up of charge and electrifying on a surface of an object regardless of an irradiated portion or non-irradiated portion, in an electrically charged particle application apparatus carrying out analysis of the object or drawing of a pattern on the surface of the object by radiating charged particles such as an electron beam 2 on the object such as a sample 7 installed in the vacuum chamber 6. SOLUTION: An electrically charged particle application apparatus includes a radical generating means for generating radical 19 coming into contact with a charged particle irradiated surface of the object such as the sample 7 in the vicinity of the object, for example, a gas supplying means such as a gas supplying source 14 and a gas conducting port 16 supplying gas 15 so that it comes into contact with the electrically charged particle irradiated surface of the object, and a UV radiating apparatus 18 radiating ultra violet rays 17 on the electrically charged particles irradiated surface of the object. Thus, the charge on the electrically charged particle irradiated surface of the object is speedily neutralized by the radical 19 and the build up of the charge and the electrifying can be prevented regardless of the irradiated portion or the non-irradiated portion of the charged particles. On the other hand, since the radical 19 is generated in the vicinity of the object and disappears in a short period of time, the physical damage to the vacuum chamber 6 can be prevented by the radical 19. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006339051(A) 申请公布日期 2006.12.14
申请号 JP20050163366 申请日期 2005.06.03
申请人 MATSUSHITA ELECTRIC IND CO LTD 发明人 MIYAJIMA TAKESHI;UEDA AKIHIKO
分类号 H01J37/20;G03F7/20;H01L21/027 主分类号 H01J37/20
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