发明名称 ELECTRON BEAM LIGHT SOURCE
摘要 PROBLEM TO BE SOLVED: To provide an electron beam light source which can irradiate electrons having a uniform current density with respect to a wide area. SOLUTION: The electron beam light source for irradiating an electron current EF against a target T, is provided with a plurality of number of electron guns 10 which are arranged two-dimensionally and which form electron beams EB, and a third grid 5 which forms the electron current EF, by making the current density have a Gaussian distribution and by making them overlapped. COPYRIGHT: (C)2007,JPO&INPIT
申请公布号 JP2006338958(A) 申请公布日期 2006.12.14
申请号 JP20050160456 申请日期 2005.05.31
申请人 TOSHIBA CORP 发明人 HASHIMOTO SUSUMU
分类号 H01J37/063;G21K1/00;G21K1/087;G21K5/04;H01J37/06;H01J37/09;H01J37/12;H01J37/305;H01L21/027 主分类号 H01J37/063
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