发明名称 |
COMPOSITION FOR CLEANING ION IMPLANTED PHOTORESIST IN FRONT END OF LINE APPLICATIONS |
摘要 |
A front end of the line (FEOL) stripping and cleaning composition for cleaning unashed ion-implanted photoresist from a wafer substrate comprises: a) at least one organic stripping solvent, b) fluoride ions from at least one of ammonium fluoride, ammonium bifluoride or hydrogen fluoride, c) at least one acidifying agent selected from inorganic or organic acids, and d) water, with an oxidizing agent optionally also being present in the composition. |
申请公布号 |
WO2006107517(A3) |
申请公布日期 |
2006.12.14 |
申请号 |
WO2006US08829 |
申请日期 |
2006.03.13 |
申请人 |
MALLINCKRODT BAKER, INC.;KANE, SEAN MICHAEL;LIPPY, STEVEN, A. |
发明人 |
KANE, SEAN MICHAEL;LIPPY, STEVEN, A. |
分类号 |
H01L21/311;C11D11/00;G03F7/42 |
主分类号 |
H01L21/311 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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