PRETREATMENT COMPOSITIONS

摘要

A pretreatment composition of (a) at least one compound having structure Vl wherein Y is selected from the group consisting of S, O, NR², (HOCH)_P, and each R¹ is independently selected from H, an alkyl group, an alkenyl group, an alkynyl group, an alkoxy group or a halogen, each R² is independently H, SH, CH₃, C₂H₅, and a linear or branched C₁-C₄ alkyl group containing a thiol group; and wherein V¹ and V² are independently selected from wherein, m is independently an integer from 0 to 4 with the proviso that m can = 0 only when Y = n is an integer from 1 to 5; p is an integer of from 1 to 4, and each R¹ is defined as above; (b) at least one organic solvent, and optionally, (c) at least one adhesion promoter; wherein the amount of the compound of Structure Vl present in the composition is effective to inhibit residue from forming when the photosensitive composition is coated on a substrate and the coated substrate is processed to form an image thereon.