| 发明名称 |
METHOD FOR THE TREATMENT OF GASES USING HIGH-FREQUENCY DISCHARGES |
| 摘要 |
The invention relates to a method for the treatment of gases comprising impurities, in which the gas, which is essentially at atmospheric pressure, is subjected to a radio-frequency inductive plasma (RF-ICP) discharge.
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| 申请公布号 |
KR20060128905(A) |
申请公布日期 |
2006.12.14 |
| 申请号 |
KR20067013582 |
申请日期 |
2006.07.06 |
| 申请人 |
L'AIR LIQUIDE SOCIETE ANONYME POUR L'ETUDE ET L'EXPLOITATION DES PROCEDES GEORGES CLAUDE |
发明人 |
MOISAN MICHEL;ROSTAING JEAN CHRISTOPHE;CARRE MARTINE;TRAN KHAN CHI |
| 分类号 |
B01D53/32;B01D53/70;B01J19/12 |
主分类号 |
B01D53/32 |
| 代理机构 |
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