| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate holder, a substrate temperature controller, and a substrate temperature control method which can increase the rate of movement of a liquid on a boundary between a substrate and the substrate holder and quickly control the substrate and a substrate temperature. SOLUTION: A substrate holder 10 includes a holder 11 for holding a wafer W and a temperature controller for controlling the temperature of the holder 11. The holder 11 includes an opening 113 which is formed on the top surface of the holder 11 and supplies a second coolant between the wafer W and the holder 11 from the temperature controller, a vacuum suction groove which is formed near the opening 113 and drains the second coolant between the wafer W and the holder 11, and an opening 116 which is formed in the vacuum suction groove and drains the second coolant from the vacuum suction groove. COPYRIGHT: (C)2007,JPO&INPIT |
