| 摘要 |
PROBLEM TO BE SOLVED: To provide a silica-based coating agent capable of forming a silica-based thin film having stability and denseness on a base material of every kind, including an organic base material, by drying and heat-treating the agent itself at a low temperature of≤200°C, to provide the silica-based thin film, and to provide a structure. SOLUTION: This silica-based coating agent contains a polyorganosiloxane obtained by copolymerizing a silica sol which is formed by hydrolyzing and condensing at least one kind selected from a tetraalkoxysilane, a partially hydrolyzed product thereof, and an oligomer comprising a condensed product thereof with an organoalkoxysilane expressed by general formula (II): R<SP>2</SP><SB>n</SB>Si(OR<SP>3</SP>)<SB>4-n</SB>(R<SP>2</SP>is H, F, a 1-10C alkyl, a 6-10C aryl, a 7-10C aralkyl or vinyl; R<SP>3</SP>is a 1-10C alkyl; and n is an integer of 1 to 3). The silica-based thin film is formed by using the coating agent. The structure contains the silica-based thin film. COPYRIGHT: (C)2007,JPO&INPIT
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