| 摘要 |
The diffraction optical element production method includes a first step of etching an area which becomes a seventh step of a seven-step staircase shape and an area which becomes a third step of a three-step staircase shape by a depth 2 L; a second step of etching areas which become second, fourth, and sixth steps of the seven-step staircase shape and an area which becomes a first step of the three-step staircase shape by a depth L; a third step of etching areas which become fifth to seventh steps of the seven-step staircase shape and areas which become second and third steps of the three-step staircase shape by the depth 2 L; and a fourth step of etching areas which become third to seventh steps of the seven-step staircase shape and areas which become second and third steps of the three-step staircase shape by the depth 2 L.
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