发明名称 ADAPTIVE REAL TIME CONTROL OF A RETICLE/MASK SYSTEM
摘要 An adaptive real time thermal processing system is presented that includes a multivariable controller (260). Generally, the method (1600) includes creating a dynamic model of the thermal processing system (1630); incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints (1650); creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time.
申请公布号 KR20060128946(A) 申请公布日期 2006.12.14
申请号 KR20067014900 申请日期 2005.01.19
申请人 TOKYO ELECTRON LIMITED 发明人 KAUSHAL SANJEEV;PANDEY PRADEEP;SUGASHIMA KENJI
分类号 H01L21/027;F23N1/00;G03F;G03F1/14;G03F7/20;H01L21/324 主分类号 H01L21/027
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