发明名称 |
ADAPTIVE REAL TIME CONTROL OF A RETICLE/MASK SYSTEM |
摘要 |
An adaptive real time thermal processing system is presented that includes a multivariable controller (260). Generally, the method (1600) includes creating a dynamic model of the thermal processing system (1630); incorporating reticle/mask curvature in the dynamic model; coupling a diffusion-amplification model into the dynamic thermal model; creating a multivariable controller; parameterizing the nominal setpoints into a vector of intelligent setpoints (1650); creating a process sensitivity matrix; creating intelligent setpoints using an efficient optimization method and process data; and establishing recipes that select appropriate models and setpoints during run-time. |
申请公布号 |
KR20060128946(A) |
申请公布日期 |
2006.12.14 |
申请号 |
KR20067014900 |
申请日期 |
2005.01.19 |
申请人 |
TOKYO ELECTRON LIMITED |
发明人 |
KAUSHAL SANJEEV;PANDEY PRADEEP;SUGASHIMA KENJI |
分类号 |
H01L21/027;F23N1/00;G03F;G03F1/14;G03F7/20;H01L21/324 |
主分类号 |
H01L21/027 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|