发明名称 CHAMBER CLEANING METHOD IN ELECTROCHEMICAL WASTEWATER DISPOSAL APPARATUS
摘要 A cleaning structure of a chamber for an electrochemical type of wastewater treatment apparatus is provided to prevent the generation or adhesion of scales or foreign substances at a blade within the chamber. In a wastewater discharge process(ST10), the wastewater introduced into a chamber is discharged. Thereafter, the washing water is projected into the chamber(ST20). The washing water introduced into the chamber is recovered again into the washing cistern(ST30). The city water is projected into the chamber so that the remaining washing water in the chamber is removed(ST40). Thereafter, the city water is discharged from the chamber(ST50).
申请公布号 KR20060128245(A) 申请公布日期 2006.12.14
申请号 KR20050049509 申请日期 2005.06.09
申请人 GS INSTRUMENT CO., LTD. 发明人 KIM, HYUN HO;LEE, JAE CHANG;GO, JUN HO;KIM, SUN HO;LIM, CHUL SOO
分类号 C02F1/46;C02F1/00 主分类号 C02F1/46
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