| 摘要 |
An evaporation source housing for vacuum deposition which creates a uniform deposition atmosphere on a plurality of deposition objects, increases initial evaporation rate and improves adhesion property by preventing molecular structure deformation of evaporation gas due to an electron beam and suggesting a predetermined orientation during evaporation of an evaporation gas is provided. In a housing for accommodating an evaporation source for vacuum deposition, an evaporation source housing for vacuum deposition comprises a cover(10) for covering a deposition source(30) so that the deposition source is positioned in a chamber(11) and a base(20) on which a deposition source(30) is put. The cover has the chamber that forms a space therein, a certain sized exhaust port(12) formed on the top thereof, a horizontal plane(13) formed on an upper portion thereof, and a vertical plane(14) that forms a wall perpendicular to the horizontal plane. The base has a connection groove(21) on which the cover can be placed such that the cover is not moved from the base when the cover and the base are connected to each other.
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