| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a light emitting diode having a region (etching region) roughened by etching at least partially on the surface in which a thin-film transparent conductive film can be formed into an effective form in the etching region and the efficiency of LED can be sharply enhanced, and to provide its fabrication method. <P>SOLUTION: A semiconductor region is made by forming an n-type semiconductor layer and a p-type semiconductor layer sequentially, a high efficiency light extraction region is made, by forming a plurality of holes in the surface of the semiconductor region, and a transparent electrode forming region is made by forming transparent electrodes made of a transparent conductive film continuously in the flat region of the high efficiency light extraction region, thus fabricating a light-emitting diode. Area percentage of the plurality of holes in the high efficiency light extraction region is 10-80%. <P>COPYRIGHT: (C)2007,JPO&INPIT |
