| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide a photocuring resin composition for photoresist, capable of being easily removing an unexposed part by a dilute alkali solution upon photocuring and superior in flexibility, adhesion, and heat resistance, and to provide a column spacer and a liquid crystal display element, made by using the photocuring resin composition for photoresist and is less likely to generate color unevenness due to low-temperature foaming and gravity failure. <P>SOLUTION: The photocuring resin composition for photoresist includes an alkali-soluble (meth)acrylic polymer (A), having a crosslinkable hydrolysable silyl group expressed by general Formula (1), a compound (B) having a molecular skeleton expressed by general Formula (2), and a compound (C) having two or more polymerizable unsaturated bonds in a molecule. <P>COPYRIGHT: (C)2007,JPO&INPIT |
