发明名称 METHOD FOR DIRECT METALLIZATION OF NON-CONDUCTING SUBSTRATES
摘要 In the plating of non-conductive substrates, a metal-salt solution for treatment of such a substrate having been treated with a metal colloid for activation, and associated method for coating non-conductive substrates, characterized by reduced incrustation the associated equipment; the metal-salt solution comprising a metal that can be reduced by the metal of the metal colloid, a complexing agent, and a metal salt having a metal of the group consisting of lithium, sodium, calcium, rubidium, and cesium in the form of a salt selected from the group consisting of fluorides, chlorides, iodides, bromides, nitrates, sulphates, and mixtures thereof.
申请公布号 US2006280872(A1) 申请公布日期 2006.12.14
申请号 US20060423474 申请日期 2006.06.12
申请人 ENTHONE INC. 发明人 KONIGSHOFEN ANDREAS;MOBIUS ANDREAS
分类号 B05D3/00 主分类号 B05D3/00
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