MULTIPLE-USE PROJECTION SYSTEM

摘要

In the case of a projection exposure method for exposing substrates, arranged in the region of an image plane of a projection objective, with at least one image of a pattern, arranged in the region of an object plane of the projection objective, of a mask, a first exposure configuration is optionally set for exposing a substrate given a first image-side numerical aperture NA1 in a first image field with a first image field size IFS1, or a second exposure configuration is optionally set for exposing substrates given a second image-side numerical aperture NA2, differing from the first image-side numerical aperture NA1, in a second image field with a second image field size IFS2 differing from the first image field size.