| 摘要 |
<P>PROBLEM TO BE SOLVED: To draw a pattern on a photosensitive material stably and at high speed. <P>SOLUTION: The pattern drawing device includes a DMD 42 that modulates a light emitting from a light source and guides it to each of light irradiation area groups arranged at two-dimensional way on a substrate, and a pattern is drawn by scanning the light irradiation area groups on the substrate and controlling the DMD 42 at the same time. In the light irradiation area groups, a plurality of light irradiation areas are arranged as an irradiation block along the specified line direction, and a plurality of irradiation blocks are arranged in the specified row direction. The DMD 42 receives inputs of a drawing signal indicating turning ON/OFF of light irradiation per mirror block corresponding to the irradiation block, and it turns ON/OFF light irradiation to the light irradiation areas at the same time. When the pattern is drawn, the number of mirror blocks to be used for pattern drawing is determined by a control computer 510 so that scanning speed may be maximized, in consideration of time required for inputting the drawing signal to the DMD 42 and the quantity of light to be applied onto the substrate. <P>COPYRIGHT: (C)2007,JPO&INPIT |
