| 摘要 |
PROBLEM TO BE SOLVED: To provide a substrate heating apparatus which can peel off a resist on the back side of a treated substrate without lengthening a treating time, and can prevent substrate carriage errors due to steam generated from the back face of the treated substrate. SOLUTION: The substrate heating apparatus includes a substrate placing table 1 having a placing face 2 for placing a circular treated substrate W whose diameter is smaller than that of the treated substrate W, and heating means 3 for heating the treated substrate W on the placing face 2 by heating the substrate placing plate 1. A plurality of substrate holding members 4 engaged with a side edge Wa of the treated substrate W placed on the placing face 2, for controlling horizontal movement of the treated substrate W is arranged at intervals in the peripheral direction in the side peripheral position of the substrate placing table 1. COPYRIGHT: (C)2007,JPO&INPIT |
