发明名称 PHOTOLITHOGRAPHISCH GEMUSTERTE AUSSERFLÄCHIGE SPULENSTRUKTUREN UND VERFAHREN ZUR ERZEUGUNG
摘要 An out-of-plane micro-structure which can be used for on-chip integration of high-Q inductors and transformers places the magnetic field direction parallel to the substrate (14) plane without requiring high aspect ratio processing. The photolithographically patterned coil structure includes an elastic member (61 a) having an intrinsic stress profile. The intrinsic stress profile biases a free portion (11) away from the substrate (14) forming a loop winding (142). An anchor portion (12) remains fixed to the substrate (14). The free portion end becomes a second anchor portion (61 c) which may be connected to the substrate (14) via soldering or plating. A series of individual coil structures (140) can be joined via their anchor portions to form inductors and transformers.
申请公布号 DE60122343(T2) 申请公布日期 2006.12.14
申请号 DE2001622343T 申请日期 2001.05.10
申请人 XEROX CORP. 发明人 CHUA, L.;LEMMI, FRANCESCO;VAN SCHUYLENBERGH, F.;LU, PING;FORK, K.;PEETERS, ERIC;SUN, DECAI;SMITH, L.;ROMANO, T.
分类号 G03C5/56;H01F41/04;G01R1/067;G01R3/00;G03C5/00;G03C5/58;G03F7/00;H01F17/00;H01F17/02;H01F27/29;H01L21/02;H01L21/027;H01L21/60;H01L21/768;H01L23/485;H01L23/49;H01L23/498;H01L23/522;H01L33/00;H01R9/03;H05K7/02 主分类号 G03C5/56
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