THERMOACID GENERATOR FOR ANTIREFLECTION FILM FORMATION, COMPOSITION FOR ANTIREFLECTION FILM FORMATION, AND ANTIREFLECTION FILM MADE THEREFROM

摘要

A thermoacid generator for antireflection film formation, characterized by being represented by the following formula (1): [Chemical formula 1] (1) (wherein R<SUP>1</SUP> represents C<SUB>1-20</SUB> alkyl, alkenyl, oxoalkyl, or oxoalkenyl (hydrogen atoms in these groups may have been replaced with fluorine atoms); R<SUP>2</SUP> represents linear, branched, or cyclic C<SUB>1-20</SUB> alkyl, alkenyl, oxoalkyl, or oxoalkenyl, C<SUB>6-20</SUB> aryl, or C<SUB>7-12</SUB> aralkyl or aryloxoalkyl; R<SUP>3</SUP> represents hydrogen or alkyl; and Y<SUP>-</SUP> represents a non-nucleophilic counter ion); a composition for forming an antireflection film; and an antireflection film made from the composition. With the thermoacid generator and composition, satisfactory etching resistance and the satisfactory ability to prevent the reflection of short-wavelength light (ability to absorb short-wavelength light) are attained. Furthermore, the antireflection film can inhibit an overlying photoresist film from generating a scum.