| 摘要 |
<P>PROBLEM TO BE SOLVED: To provide an exposure technology capable of forming, at a low cost, a fine pattern of wavelength of illumination light or finer. <P>SOLUTION: In the exposure device, a translucent flat plate P1 in which a first diffraction grating is formed and a translucent flat plate P2 in which a second diffraction grating is formed are arranged in order on the optical path of illumination light from a light source 1. A wafer W is irradiated with the diffraction light from the second diffraction grating so that an interference fringe pattern is exposed on the wafer W. Laser interferometers 40 and 86 are used to measure positional relationship between the translucent flat plate P2 and the wafer W. Laser interferometers 82 and 86 are used to measure positional relationship between the translucent flat plate P1 and the translucent flat plate P2. According to the measurement values, the relationships are set to be a specified relationship. <P>COPYRIGHT: (C)2007,JPO&INPIT |
