| 摘要 |
<P>PROBLEM TO BE SOLVED: To obtain a focus position control method of an exposing device, with which deviation of a focus position of a laser beam is reduced, and the exposing device. <P>SOLUTION: The deviation of the focus position of the laser beam, caused by a difference in light transmittance of photosensitive portions, is reduced by preliminarily setting a focus correction value based on the difference in light transmittance of the photosensitive portions of photosensitive materials, and transferring a Z stage as far as the focus correction value based on the focus correction value, and thereby accuracy of the focus positions of the light beams of respective exposing heads is improved. <P>COPYRIGHT: (C)2007,JPO&INPIT |
