| 摘要 |
PROBLEM TO BE SOLVED: To provide an apparatus for depositing a thin film on a three-dimensional hollow container capable of consistently performing the film deposition. SOLUTION: The apparatus for depositing a thin film on a three-dimensional hollow container comprises a means to fix a hollow container on the center axis in a cylindrical metallic container, a means in which a metallic raw material gas introducing pipe to fill in a raw material gas is arranged on the center axis, and the metallic container is evacuated, and a microwave energy filling means to fill the energy via a square waveguide. The apparatus deposits a thin film by the CVD method by using plasma obtained by the microwave energy sealed in the semi-coaxial resonator mode. A space in which the optimum waveguide mode in a cylindrical cavity resonator is present is provided between a tip of the metallic raw material gas introduction pipe which is a center conductor of the semi-coaxial resonator mode and a top face of a cylindrical metallic container in order to perform the conversion from the waveguide mode as the microwave propagation mode into the semi-coaxial resonator mode. COPYRIGHT: (C)2007,JPO&INPIT
|
