| 发明名称 |
SYSTEM AND METHOD FOR INSPECTING WAFERS IN A LASER MARKING SYSTEM |
| 摘要 |
An illumination system is disclosed for use in a semiconductor wafer back side inspection assembly. The illumination system includes an illumination source that is configured to direct illumination toward a highly reflective and directionally reflective surface at an angle a of about 45 degrees to about 75 degrees with respect to the surface. |
| 申请公布号 |
WO2006132698(A2) |
申请公布日期 |
2006.12.14 |
| 申请号 |
WO2006US12242 |
申请日期 |
2006.03.31 |
| 申请人 |
GSI GROUP CORPORATION;SCHRAMM, RAINER;EHRMANN, JONATHAN |
发明人 |
SCHRAMM, RAINER;EHRMANN, JONATHAN |
| 分类号 |
B23K26/40;B23K31/12;B23K101/40;G01N21/88;G01N21/95;G01N21/956;H01L21/66 |
主分类号 |
B23K26/40 |
| 代理机构 |
|
代理人 |
|
| 主权项 |
|
| 地址 |
|
