A DEFOCUS IMPROVEMENT DEVICE OF SEMECONDUCTOR PATTERN PROCESS

摘要

A defocus improving apparatus in a semiconductor pattern process is provided to prevent the generation of semiconductor pattern failure by supporting horizontally a wafer regardless of the existence of particles using a plurality of movable pin members. A defocus improving apparatus in a semiconductor pattern process includes a chuck and a plurality of movable pin members. The chuck(10) is used for loading a wafer(1). The chuck has a flat upper surface. The plurality of movable pin members(20) are fixed to the chuck in order to support horizontally the wafer regardless of the existence of particles(2) on a rear surface of the wafer.