| 摘要 |
<p>An interface device of a photo-lithography apparatus is provided to exactly adjust a support plate by mounting a distance measuring module. A support plate(120) supports a loader and a feeder. A plurality of wafer cassettes are provided at the loader. The feeder feeds a wafer. A height control unit(150) controls a height of the support plate. A distance measuring module(160) is provided at one side of the height control unit and measures a moving distance of the support plate, which is moved by the height control unit. The height control unit includes a movable plate(125), a guide(156), a ball screw shaft(155), a first bevel gear(153), a second bevel gear(154), a screw shaft(152), and a handle(151). The movable plate is provided at a lower portion of the support plate and elevates the support plate. The guide is fixed to one side of the movable plate.</p> |
