发明名称 |
COMOSITION USEFUL FOR REMOVAL OF BOTTOM ANTI-REFLECTION COATINGS FROM PATTERNED ION-IMPLANTED PHOTORESIST WAFERS |
摘要 |
A method and composition for removing a bottom anti-reflection coating (BARC) layer from semiconductor substrates having such BARC layers is described. The removal composition includes a supercritical fluid, a co-solvent, an etchant and a surfactant. Such removal compositions overcome the intrinsic deficiency of SCCO2 as a removal reagent, viz., the non-polar character of SCCO2 and its associated inability to solubilize species such as inorganic salts and polar organic compounds that must be removed from the semiconductor substrate.
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申请公布号 |
KR20060128037(A) |
申请公布日期 |
2006.12.13 |
申请号 |
KR20067020257 |
申请日期 |
2006.09.28 |
申请人 |
ADVANCED TECHNOLOGY MATERIALS INC. |
发明人 |
KORZENSKI MICHAEL B.;BAUM THOMAS H. |
分类号 |
C09K13/04;B08B6/00;C09K13/08;C11D3/02;C11D3/20;C11D3/39;C11D3/43;C11D11/00;G03F7/09;G03F7/42;H01L21/02;H01L21/311;H01L21/44;H01L21/4763 |
主分类号 |
C09K13/04 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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