APPARATUS FOR TREATING SUBSTRATE

摘要

A substrate processor is provided to support a substrate and exhaust process gas using a simple structure. A process chamber(10) defines a reaction space(11). A discharge port(12) is formed at a lower portion of the process chamber. A substrate support member includes a positioning portion(31) and a support shaft(32). The positioning portion is positioned inside the process space. The support shaft the discharge port. A housing(40) encloses the support shaft exposed to an outside of the process chamber. A vertical driver drives the support shaft up and down. A rotation driver rotates the support shaft.