IMPROVED IMMERSION LITHOGRAPHY SYSTEM WITH WAFER SEALING MECHANISMS

摘要

An improved immersion lithographic system is provided to prevent the leakage of an immersion fluid by covering a wafer edge portion using a wafer sealing mechanism with a sealing rod. An immersion lithographic system includes fluid storing members and a sealing rod. The fluid storing members supply an immersion fluid(308) onto a wafer in order to performing an immersion lithographic process. The sealing rod(318) is used for covering an edge portion of the wafer. The sealing rod is capable of preventing the leakage of the immersion fluid under the immersion lithographic process. The immersion lithographic system further includes a wafer stage for holding the wafer.