发明名称 METHOD OF PATTERNING BY USE OF FLUORINATED POLYMER, AND METHOD OF MANUFACTURING ORGANIC THIN FILM TRANSISTOR BY USE OF THE SAME
摘要 <p>A patterning method using fluorinated polymer and a method for manufacturing an organic thin film transistor by using the same are provided to form easily a patterned organic layer by using a patterned fluorinated polymer layer. A plurality of patterns composed of fluorinated polymer is formed by using a stepping method using a mold. An organic material is arranged between the patterns composed of the fluorinated polymer. The mold is formed with PDMS(PolyDiMethyl Silazane). The fluorinated polymer is formed with parylene, vinylidenefluoride or tetrafluoroethylene. The organic material is formed with an organic semiconductor material or a PEDOT(Poly(3,4-ethylenedioxythiophene)).</p>
申请公布号 KR100659118(B1) 申请公布日期 2006.12.12
申请号 KR20050120926 申请日期 2005.12.09
申请人 SAMSUNG SDI CO., LTD. 发明人 JEONG, JONG HAN
分类号 H01L29/786;H01L21/56 主分类号 H01L29/786
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