发明名称 Method of manufacturing thin film transistor
摘要 Impurity ions contained in a semiconductor layer are diffused downwardly from a gate electrode by irradiating laser light from the back surface of a transparent substrate after source-drain regions are formed. Thus, a GOLD structure is formed. Consequently, the GOLD structure is formed by performing a smaller number of processes. Also, variation in characteristics can be suppressed by preventing occurrence of asymmetry between left and right LDD regions.
申请公布号 US7148091(B2) 申请公布日期 2006.12.12
申请号 US20050196574 申请日期 2005.08.04
申请人 MITSUBISHI DENKI KABUSHIKI KAISHA 发明人 ITOH YASUYOSHI;KUBOTA TAKESHI;TAKEGUCHI TORU
分类号 H01L21/00;H01L21/336 主分类号 H01L21/00
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