发明名称 Organometallic compound, its synthesis method, and solution raw material and metal-containing thin film containing the same
摘要 The organometallic compound of the present invention is a compound that has bonds between metal atoms and nitrogen atoms or bonds between semimetal atoms and nitrogen atoms, and the content of chlorine in the compound is 200 ppm or less and the content of water is 30 ppm or less. In addition, the general formula of this compound is represented by the following formula (1): <?in-line-formulae description="In-line Formulae" end="lead"?>M[(R<SUP>1</SUP>)<SUB>2</SUB>N]<SUB>(n-s)</SUB>(R<SUP>2</SUP>)<SUB>s</SUB> (1)<?in-line-formulae description="In-line Formulae" end="tail"?> wherein, M represents a metal atom or semimetal atom, with the metal atom being Hf, Zr, Ta, Ti, Ce, Al, V, La, Nb or Ni, and the semimetal atom being Si, R<SUP>1 </SUP>represents a methyl group or ethyl group, R<SUP>2 </SUP>represents an ethyl group, n represents the valence of M, and s represents an integer of 0 to n-1.
申请公布号 US7148367(B2) 申请公布日期 2006.12.12
申请号 US20040764273 申请日期 2004.01.23
申请人 MITSUBISHI MATERIALS CORPORATION 发明人 ITSUKI ATSUSHI
分类号 C07F7/00;C07F5/00;C07F7/02;C07F7/10;C07F9/00;C07F15/00;C23C16/00;C23C16/34;C23C16/40;H01L21/316 主分类号 C07F7/00
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