发明名称 |
TRANSPARENT AND CONDUCTIVE OXIDE LAYER, PRODUCTION AND USE THEREOF IN A THIN FILM SOLAR CELL |
摘要 |
The invention relates to a method for the production of a conductive and transparent zinc oxide layer on a substrate by reactive sputtering. The process comprises a hysteresis region. Said method is characterised by the following steps: A doped metal Zn target is used, whereby the doping content of the target is less than 2.3 at- %, the heater is adjusted for the substrate in such a manner that a substrate temperature is adjusted to above 200 °C. A dynamic deposition rate is adjusted to more than 50 nm*m/min, which corresponds to a static deposition rate which is greater than 190 nm/min, and a stabilised working point is selected within the unstable process range which is between the turning point between a stable, metal and unstable process and between the inflection point of the stabilised process curve.
|
申请公布号 |
KR20060127081(A) |
申请公布日期 |
2006.12.11 |
申请号 |
KR20067014912 |
申请日期 |
2006.07.24 |
申请人 |
FORSCHUNGSZENTRUM JULICH GMBH |
发明人 |
RECH BERND;HUPKES JURGEN;KLUTH OLIVER;MUELLER JOACHIM |
分类号 |
C23C14/34;C23C14/00;C23C14/08 |
主分类号 |
C23C14/34 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|